Some considerations on target chamber design-Reference-Cited by-同舟云学术

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Some considerations on target chamber design

Published:1981-10 Issue:1 Volume:189 Page:281-286
ISSN:0167-5087
Container-title:Nuclear Instruments and Methods in Physics Research
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research

Author:

Stocker Rudolf J.

Publisher

Elsevier BV

Subject

General Engineering

Reference9 articles.

1. Ionenimplantation;Ryssel,1978

2. Rotating Scan for Ion Implantation

3. Hot-electron relaxation effects in devices

4. A high current ion implanter with hybrid scanning

5. 4th Int. Conf. on Ion implantation into semiconductors and other materials;Freeman,1975

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Target heating in ion implantation;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1990-03

2. Wafer Cooling, Faraday Design and Wafer Charging;Ion Implantation Science and Technology;1988

3. Wafer cooling in ion implantation;Microelectronics Journal;1985-03

4. Wafer Cooling in Ion Implantation;Ion Implantation: Equipment and Techniques;1983

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