Low yield sputtering of monocrystalline metals-Reference-Cited by-同舟云学术

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Low yield sputtering of monocrystalline metals

Published:1980-03 Issue:1-3 Volume:170 Page:341-346
ISSN:0029-554X
Container-title:Nuclear Instruments and Methods
language:en
Short-container-title:Nuclear Instruments and Methods

Author:

van Veen A.,Fluit J.M.

Publisher

Elsevier BV

Subject

General Medicine

Reference11 articles.

1. Tokamak reactors for breakeven;Behrisch,1977

2. Theory of Sputtering. I. Sputtering Yield of Amorphous and Polycrystalline Targets

3. Inelastic ion-surface collisions;Sigmund,1977

Cited by 12 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Energy and angular distributions of sputtered particles;International Journal of Mass Spectrometry and Ion Processes;1994-12

2. Molecular dynamics study of ion impact phenomena;Journal of Physics: Condensed Matter;1994-09-19

3. Molecular Dynamics Study of Ion Impact Phenomena and Compressive Stress in Thin Films;MRS Proceedings;1993

4. Angular, energy, and mass distribution of sputtered particles;Topics in Applied Physics;1991

5. Quantitative sputtering;Surface and Interface Analysis;1988-01

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