Characterization of amorphous silicon films by Rutherford backscattering spectrometry
Author:
Publisher
Elsevier BV
Subject
General Medicine
Reference18 articles.
1. Doped amorphous semiconductors
2. Solar cells using discharge-produced amorphous silicon
3. Effect of annealing on the optical properties of plasma deposited amorphous hydrogenated silicon
4. Infrared vibrational spectra of rf-sputtered hydrogenated amorphous silicon
5. Influence of deposition conditions on sputter‐deposited amorphous silicon
Cited by 18 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Chemical Vapor Deposition Under Plasma Conditions;Film Deposition by Plasma Techniques;1992
2. Hydrogen diffusion in aSi:H;Solid State Communications;1990-04
3. Glow-discharge amorphous silicon: Growth process and structure;Materials Science Reports;1987-01
4. Hydrogen Measurement of Thin Film Silicon: Hydrogen Alloy Films Technique Comparison;MRS Proceedings;1985
5. Surface wave attenuation by silicon, hydrogen, and deuterium in amorphous silicon films;Journal of Non-Crystalline Solids;1984-10
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