Author:
Mitchell I.V.,Eschbach H.L.,Barfoot K.M.
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4. How accurate are absolute rutherford backscattering yields
Cited by
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1. Atomic mixing during multiple species implantation of Si;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1987-01
2. Range distributions in multiply implanted targets;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1984-03
3. A comparative study of methods for thin-film and surface analysis;Reports on Progress in Physics;1984-03-01
4. MEASUREMENT AND CONTROL OF ION IMPLANTATION ACCELERATOR PARAMETERS;Ion Implantation Science and Technology;1984
5. Ion beam dosimetry by Rutherford backscattering with continuous rotation of the sample;Nuclear Instruments and Methods in Physics Research;1983-12