The design philosophy for a 200 kV industrial high current ion implanter-Reference-Cited by-同舟云学术

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The design philosophy for a 200 kV industrial high current ion implanter

Published:1976-12 Issue: Volume:139 Page:125-134
ISSN:0029-554X
Container-title:Nuclear Instruments and Methods
language:en
Short-container-title:Nuclear Instruments and Methods

Author:

Aitken D.

Publisher

Elsevier BV

Subject

General Medicine

Reference7 articles.

1. J.H. Freeman, Proc. Int. Mass Spec. Conf. (Kyoto, Japan); also A.E.R.E. Report R6254.

2. J.H. Freeman, L.R. Caldecourt, K.C.W. Done and R.J. Francis, A.E.R.E. Report R6496.

3. Lintott Specification Sheets 1038B and 1248A.

4. Lintott Patent No. 1389294.

5. Ion implantation;Dearnaley,1973

Cited by 15 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. The development of ion implanter technology;Vacuum;1989-01

2. A new approach to ion implanter mass analysis optics;Vacuum;1986-11

3. High-Dose Implantation;Ion Implantation and Beam Processing;1984

4. The Series IIIA and IIIX Ion Implanters;Ion Implantation Techniques;1982

5. Ion Implantation System Concepts;Ion Implantation Techniques;1982

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