Historical perspective and future trends for ion implantation systems
Author:
Publisher
Elsevier BV
Subject
General Engineering
Reference7 articles.
1. W. Shockley, U.S. Patent 2 787.564.
2. Proc. Europ. Conf. on Ion implantation;Freeman,1970
3. Ionen-Implantation;Ryssel,1978
4. Ion implantation in semiconductors;Freeman,1975
5. A high current ion implanter with hybrid scanning
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