1. Review of secondary ion mass spectrometry characterization of contamination associated with ion implantation;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1994-07
2. DOSIMETRY DESIGN CONSIDERATIONS FOR SERIAL AND BATCH ION IMPLANTATION SYSTEMS;Ion Implantation Technology–92;1993
3. Measurements of ion-beam dose rate with a calorimetric sensor;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1990-06
4. A charged‐particle analyzer for radio‐frequency discharges;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1989-11
5. MEASUREMENT OF ION IMPLANTATION;Ion Implantation Science and Technology;1988