Monte Carlo Methods and Microlithography Simulation for Electron and X-Ray Beams-Reference-Cited by-同舟云学术

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Monte Carlo Methods and Microlithography Simulation for Electron and X-Ray Beams

Published:1987 Issue: Volume: Page:175-259
ISSN:0065-2539
Container-title:Advances in Electronics and Electron Physics Volume 69
language:
Short-container-title:

Author:

Murata Kenji,Kyser David F.

Publisher

Elsevier

Reference183 articles.

1. I. Adesida, T.E. Everhart (1980). Proc. Int. Conf. Electron Ion Beam Sci. Technol., 9th, p. 189.

2. High resolution electron‐beam lithography on thin films

3. “X-ray Spectroscopy,”;Agarwal,1979

4. Proximity effect dependence on substrate material

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1. Monte Carlo calculation of the backscattering coefficient of thin films of low on high atomic number materials and the reverse as a function of the incident electron energy and film thickness;Applied Physics A;2018-09-19

2. References;Introduction to the Physics of Electron Emission;2017-10-31

3. A comparative study of inelastic scattering models at energy levels ranging from 0.5 keV to 10 keV;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2017-03

4. Controlling gold nanoparticle assembly on electron beam-reduced nitrophenyl self-assembled monolayers via electron dose;Colloids and Surfaces A: Physicochemical and Engineering Aspects;2013-09

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