Single atom scale lithography for single electron devices
Author:
Publisher
Elsevier BV
Subject
Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Reference6 articles.
1. Fabrication of sub-10 nm structures by lift-off and by etching after electron-beam exposure of poly(methylmethacrylate) resist on solid substrates
2. Resolution limits for electron-beam lithography
3. Focused ion beam direct deposition of gold
4. Fabrication of atomic-scale metallic microstructures by retarding-field focused ion beams
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