Negative UV–NIL (NUV–NIL) – A mix-and-match NIL and UV strategy for realisation of nano- and micrometre structures-Reference-Cited by-同舟云学术

Negative UV–NIL (NUV–NIL) – A mix-and-match NIL and UV strategy for realisation of nano- and micrometre structures

Published:2009-04 Issue:4-6 Volume:86 Page:654-656
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Skjolding Lars Henrik Dæhli,Teixidor Genis Turon,Emnéus Jenny,Montelius Lars

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference11 articles.

1. EBL/NIL fabrication and characterization of interdigitated electrodes for potential application in combinatorial studies;Skjolding,2008

2. M. Wissen, N. Bogdanski, S. Moellenbeck, H.C. Scheer, Strategies for hybrid techniques of uv lithography and thermal nanoimprint – art. no. 67920v, in: U.F.W. Behringer (Ed.), Proceedings of the Society of Photo-optical Instrumentation Engineers (SPIE), vol. 6792, 2008, pp. V7920–V7920.

3. T. Hoffmann, Alternative lithography: unleashing the potentials of nanotechnology, in: Nanostructure Science and Technology, Plenum Pub Corp, 2003, Ch. Viscoelastic Properties of Polymers, ISBN:978-0-306-47858-1, pp. 25–44.

4. Mix and match of nanoimprint and UV lithography;Reuther,2001

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