Author:
Schermer S.,Helke C.,Reinhardt M.,Hartmann S.,Tank F.,Wecker J.,Heldt G.,Voigt A.,Reuter D.
Reference12 articles.
1. MEMS for photonic integrated circuits;Errando-Herranz;IEEE J. Sel. Top. Quantum Electron.,2019
2. Electron beam lithography in nanoscale fabrication: recent development;Tseng;IEEE Trans. Electron. Packag. Manuf.,2003
3. Lithographic performance of resist ma-N 1402 in an e-beam/i-line stepper intra-level mix and match approach;Canpolat-Schmidt,2022
4. Intra-level mix and match lithography with electron beam lithography and i-line stepper combined with resolution enhancement for structures below the CD-limit;Helke;Micro Nano Eng.,2023
5. Development of an e-beam/i-line stepper intra-level mix and match approach with the photoresist mr-EBL 6000.5 for PIC related structures such as waveguides, ring resonators and coupling structures;Reinhardt,2023