Author:
Tsutsui Kazuo,Xiang Ruifei,Nagahiro Koji,Shiozawa Takashi,Ahmet Parhat,Okuno Yasutoshi,Matsumoto Michikazu,Kubota Masafumi,Kakushima Kuniyuki,Iwai Hiroshi
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference3 articles.
1. NiSi salicide technology for scaled CMOS
2. Thermal stability study of NiSi and NiSi2 thin films
3. K. Tsutsui, R. Xiang, K. Nagahiro, T. Shiozawa, P. Ahmet, Y. Okuno, M. Matsumoto, M. Kubota, K. Kakushima, H. Iwai, in: Ext. Abs. of 6th International Workshop on Junction Technology (IWJT2006), 2006, p. 188.
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