Author:
Gilmartin Stephen F.,Arshak Khalil,Bain Dave,Lane William A.,Collins Damian,Arshak Arousian,McCarthy Brendan,Newcomb Simon B.,Walsh Michelle
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference21 articles.
1. S.F. Gilmartin et al., Fabrication and integration of nanobolometer sensors on a MEMs process, in: Proceedings of the 2008 NSTI Nanotechnology Conference, Nano Science and Technology Institute, Cambridge, United States, 2008, pp. 596–599.
2. S.F. Gilmartin et al., Uncooled IR nanobolometers fabricated by electron beam lithography and a MEMS/CMOS process, in: Proceedings of the NANO ‘08. 8th IEEE Conference on Nanotechnology, 2008, pp. 131–134.
3. Microscopic and macroscopic uniformity control in plasma etching
4. Microscopic uniformity in plasma etching
5. D.F. Murphy et al., High Sensitivity 640×512 (20 micron pitch) microbolometer FPAs, SPIE, 2006, p. 62061A.
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