Comprehensive defect analysis methodology for nano imprint lithography-Reference-Cited by-同舟云学术

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Comprehensive defect analysis methodology for nano imprint lithography

Published:2007-05 Issue:5-8 Volume:84 Page:989-993
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

DiBiase T.,Ahamdian M.,Malik I.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference5 articles.

1. I. Peterson, G. Thompson, T. DiBiase, S. Ashkenaz, R. Pinto, Yield Management Solutions, KLA-Tencor Spring, 2000.

2. J. Huang, L. Peng, C.W. Chu, K. Bhattacharyya, B. Eynon, F. Mirzaagha, T. DiBiase, K. Son, J. Cheng, Yield Management Solutions, KLA-Tencor Spring, 2006.

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Automatic detection of NIL defects using microscopy and image processing;Microelectronic Engineering;2013-12

2. Materials and Processes in UV-Assisted Nanoimprint Lithography;Generating Micro- and Nanopatterns on Polymeric Materials;2011-03-19

3. High-power laser interference lithography process on photoresist: Effect of laser fluence and polarisation;Applied Surface Science;2009-03

4. Nanoimprint lithography stamp modification utilizing focused ion beams;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2009

5. Molecular Dynamics Study of Yield Stress of Si Mold for Nanoimprint Lithography;Japanese Journal of Applied Physics;2008-04-18

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