Nanoimprint lithography stamp modification utilizing focused ion beams-Reference-Cited by-同舟云学术

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Nanoimprint lithography stamp modification utilizing focused ion beams

Published:2009 Issue:6 Volume:27 Page:2679
ISSN:1071-1023
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:en
Short-container-title:J. Vac. Sci. Technol. B

Author:

Wanzenboeck Heinz D.,Waid Simon,Bertagnolli Emmerich,Muehlberger Michael,Bergmair Iris,Schoeftner Rainer

Publisher

American Vacuum Society

Subject

Electrical and Electronic Engineering,Condensed Matter Physics

Cited by 15 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Nanoimprinting of Biomimetic Nanostructures;Nanomanufacturing;2022-02-09

2. Nanoimprint Replication of Biomimetic, Multilevel Undercut Nanostructures;Nanomaterials;2021-04-20

3. Influence of ion species of AuSi liquid metal alloy source-focused ion beam on SiO2/Si nanopatterning;Thin Solid Films;2019-01

4. CMOS-Compatible Silicon Nanowire Field-Effect Transistor Biosensor: Technology Development toward Commercialization;Materials;2018-05-11

5. Function follows form: combining nanoimprint and inkjet printing;33rd European Mask and Lithography Conference;2017-09-28

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