Low-cost fabrication of nanoimprint templates with tunable feature sizes at a constant pitch-Reference-Cited by-同舟云学术

Low-cost fabrication of nanoimprint templates with tunable feature sizes at a constant pitch

Published:2017-02 Issue: Volume:170 Page:34-38
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Si Shuhao^ORCID,Dittrich Lars,Hoffmann Martin

Funder

Institute of Micro- and Nanotechnologies MacroNano®

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference13 articles.

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3. 15 days electron beam exposure for manufacturing of large area silicon based NIL master;Thrun;Microelectron. Eng.,2013

4. Soken Chemical & Engineering, Stampkind product brochure, https://www.soken-ce.co.jp/en/product/nano_imprint.

5. Nanoimprint lithography: an old story in modern times? A review;Schift;J. Vac. Sci. Technol. B,2008

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