Author:
Chang K.,Shanmugasundaram K.,Lee D.O.,Roman P.,Wu C.-T.,Wang J.,Shallenberger J.,Mumbauer P.,Grant R.,Ridley R.,Dolny G.,Ruzyllo J.
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference7 articles.
1. Mist deposited high-k dielectrics for next generation MOS gates
2. C.-T. Wu, R.S. Ridley, G. Dolny, T. Grebs, C. Knoedler, S. Suliman, B. Venkataraman, O. Awadelkarim, J. Ruzyllo, in: Proceedings of the 14th International Symposium on Power Semiconductor Devices and ICs, 2002, pp. 149–152
3. Technical Literature, Primaxx-2F, Primaxx, Inc., Allentown, PA
4. Fluorine in Thermal Oxides from HF Preoxidation Surface Treatments
5. Surface Charge Evolution during Early Stage of Thermal Oxidation of Silicon
Cited by
2 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献