Thermodynamic modeling of the Hf–Si–O system
Author:
Publisher
Elsevier BV
Subject
Computer Science Applications,General Chemical Engineering,General Chemistry
Reference44 articles.
1. Hafnium: Physico-chemical properties of its compounds and alloys;Komarek,1981
2. Thermal decomposition behavior of the HfO2/SiO2/Si system
3. Thermodynamic stability of binary oxides in contact with silicon
4. Phase Separation in Hafnium Silicates for Alternative Gate Dielectrics
5. Thermodynamic stability of high-K dielectric metal oxides ZrO2 and HfO2 in contact with Si and SiO2
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