Author:
Lauvernier Denis,Vilcot Jean-Pierre,François Marc,Decoster Didier
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference8 articles.
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3. Three-dimensional siloxane resist for the formation of nanopatterns with minimum linewidth fluctuations
4. Nano-patterning of a hydrogen silsesquioxane resist with reduced linewidth fluctuations
5. Sub-10 nm Linewidth and Overlay Performance Achieved with a Fine-Tuned EBPG-5000 TFE Electron Beam Lithography System
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