Author:
Tseng Hsing-Huang,Kirsch Paul,Park C.S.,Bersuker Gennadi,Majhi Prashant,Hussain Muhammad,Jammy Raj
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference26 articles.
1. K. Kita, A. Toriumi, IEDM Technical Digest, 2008, p. 29.
2. P. Sivasubramani, T.S. Böscke, J. Huang, C.D.Young, P.D. Kirsch, M.A. Quevedo-Lopez, S. Govindarajan, B.S. Ju, H.R. Harris, D.J. Lichtenwalner, J.S. Jur, A.I. Kingon, J. Kim, B.E. Gnade, R.M. Wallace, G. Bersuker, B.H. Lee, R. Jammy, Technical Digest of VLSI Symposium, 2007, p. 68.
3. Dipole model explaining high-k/metal gate field effect transistor threshold voltage tuning
4. Engineering High Dielectric Constant Materials for Band-Edge CMOS Applications
5. Examination of flatband and threshold voltage tuning of HfO2∕TiN field effect transistors by dielectric cap layers
Cited by
15 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献