High-k gadolinium and aluminum scandates for hybrid floating gate NAND flash-Reference-Cited by-同舟云学术

High-k gadolinium and aluminum scandates for hybrid floating gate NAND flash

Published:2013-09 Issue: Volume:109 Page:220-222
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Lisoni Judit G.,Breuil Laurent,Nyns Laura,Blomme Pieter,Van den bosch Geert,Van Houdt Jan

Funder

IMEC’s Industrial Affiliation Program on Advanced Flash Memory

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference7 articles.

1. Hybrid Floating Gate Cell for Sub-20-nm NAND Flash Memory Technology

2. Rare Earth Oxide Thin Films;Fanciulli,2007

3. L. Nyns, J.G. Lisoni, G. Van den bosch, S. Van Elshocht, J. Van Houdt, Symposium N E-MRS (2013), presentation N.VI.4.

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