Author:
Shanmugasundaram K.,Brubaker M.,Chang K.,Mumbauer P.,Roman P.,Ruzyllo J.
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference6 articles.
1. Mist Deposition in Semiconductor Device Manufacturing;Mumbauer;Semicon. Intern.,2004
2. Mist Deposited High-k Dielectrics for Next Generation MOS Gates;Lee;Solid-State Electronics,2002
3. Chemical Solution Deposition and Characterization of Ferroelectric and Dielectric Thin Films;Solayappan;Integrated Ferrolectrics,1999
4. K. Chang, Engineering of Semiconductor Dielectric Interface in MOS Gate Structures, Ph.D. Dissertation, Penn State Univ. 2005.
5. Charge Trapping in HfO2 and HfSiO4 Gate Dielectrics;Chang;Solid-State Electronics,2006
Cited by
2 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Aerosol Deposition;Chemical Solution Deposition of Functional Oxide Thin Films;2013
2. Characterization of Aluminum Silicate (AlSiO) Insulator Films;IEEJ Transactions on Electronics, Information and Systems;2007