Development of metal etch mask by single layer lift-off for silicon nitride photonic crystals-Reference-Cited by-同舟云学术

Development of metal etch mask by single layer lift-off for silicon nitride photonic crystals

Published:2011-06 Issue:6 Volume:88 Page:994-998
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Lim Kang-mook,Gupta Shilpi,Ropp Chad,Waks Edo

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference22 articles.

1. Strong localization of photons in certain disordered dielectric superlattices

2. Two-dimensional photonic-bandgap structures operating at near-infrared wavelengths

3. Silicon nitride films on silicon for optical waveguides

4. Comparison Among Various<tex>$hbox Si_3hboxN _4$</tex>Waveguide Geometries Grown Within a CMOS Fabrication Pilot Line

5. Spectral and spatial narrowing of the emission of silicon nanocrystals in a microcavity

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