Total process function in electron beam lithography-Reference-Cited by-同舟云学术

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Total process function in electron beam lithography

Published:2015-08 Issue: Volume:143 Page:1-4
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Hoffmann Karl E.,Asteiner Michael,Speckbacher Peter

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference9 articles.

1. F. Salvat, J. M. Fernández-Varea, J. Sempau, PENELOPE–2011 A Code System for Monte Carlo Simulation of Electron and Photon Transport, (OECD/NEA, 2011).

2. Benchmark test of Monte-Carlo simulation for high resolution electron beam lithography

3. Determining the Resolution Limits of Electron-Beam Lithography: Direct Measurement of the Point-Spread Function

4. NIST Digital Library of Mathematical Functions, http://dlmf.nist.gov/, Release 1.0.8 of 2014-04-25.

5. Point exposure distribution measurements for proximity correction in electron beam lithography on a sub-100 nm scale

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Point spread function and total process function measured for a variable-shaped electron beam system;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2016-07

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