Delta lithography method to increase CD uniformity and throughput of SLM-based maskless lithography-Reference-Cited by-同舟云学术

Delta lithography method to increase CD uniformity and throughput of SLM-based maskless lithography

Published:2010-05 Issue:5-8 Volume:87 Page:1135-1138
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Seo Manseung,Kim Haeryung

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference5 articles.

1. SLM device for 193nm lithographic applications

2. RET simulations for SLM-based maskless lithography

3. T. Kanatake, High Resolution Point Array, Patent No. US 6,870,604 B2, 2005.

4. Lithography upon micromirrors

5. M. Seo, H. Kim, Regular Lithography Method, Patent Pending, KR Application No. 10-2008-0079353, 2008.

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4. Development of Photolithography Process for Printed Circuit Board Using Liquid Crystal Mask in Place of Photomask;Japanese Journal of Applied Physics;2012-09-20

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