SLM device for 193nm lithographic applications-Reference-Cited by-同舟云学术

SLM device for 193nm lithographic applications

Published:2009-04 Issue:4-6 Volume:86 Page:569-572
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Lauria John,Albright Ronald,Vladimirsky Olga,Hoeks Maarten,Vanneer Roel,Drieenhuizen Bert van,Chen Luoqi,Haspeslagh Luc,Witvrouw Ann

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference3 articles.

1. L. Haspeslagh, J. De Coster, O. Varela Pedreira, I. De Wolf, B. Du Bois, A. Verbist, R. Van Hoof, M. Willegems, S. Locorotondo, G. Bryce, J. Vaes, B. Van Drieenhuizen, A. Witvrouw, in: Proceedings of IEDM 2008, pp. 656–658.

2. M. Gromova, L. Haspeslagh, A. Verbist, B. Du Bois, R. Van Hoof, B. Eyckens, B. Sijmus, I. De Wolf, V. Simons, Ph. Muller, T. Lauwagie, M. Willegems, S. Locorotondo, W. Boullart, K. Baert, A. Witvrouw, in: Proceedings of IEEE MEMS, 2007, pp. 759–762.

3. Elizabeth M. Stone, Jason D. Hintersteiner, Wenceslao A. Cebuhar1, Ronald Albright, Nicholas K. Eib, Azat Latypov, Nabila Baba-Ali, Sherman K. Poultney, Ebo H. Croffie, in: SPIE Proceedings, 2006.

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