Design and measurement of nanopatterns for FIB reliability assessments-Reference-Cited by-同舟云学术

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Design and measurement of nanopatterns for FIB reliability assessments

Published:2007-05 Issue:5-8 Volume:84 Page:818-821
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Kang Hyun-Wook,Cho Dong-Woo

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference11 articles.

1. Design and realization of a very high-resolution FIB nanofabrication instrument

2. Growth of three-dimensional nano-structures using FIB-CVD and its mechanical properties

3. J. Orloff, M. Utlut, L. Swanson, Kluwer Academic/Plenum Publishers, 2003.

4. Dot lithography for zero‐dimensional quantum wells using focused ion beams

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Influence of twice-deposited etching mask layers on verticality of nanostructures;Thin Solid Films;2012-09

2. Review: Developments in micro/nanoscale fabrication by focused ion beams;Vacuum;2012-02

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