Development of a novel, low-viscosity UV-curable polymer system for UV-nanoimprint lithography-Reference-Cited by-同舟云学术

Development of a novel, low-viscosity UV-curable polymer system for UV-nanoimprint lithography

Published:2007-05 Issue:5-8 Volume:84 Page:984-988
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Vogler Marko,Wiedenberg Sabine,Mühlberger Michael,Bergmair Iris,Glinsner Thomas,Schmidt Holger,Kley Ernst-Bernhard,Grützner Gabi

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference18 articles.

1. Nanoimprint lithography

2. Advanced Polymers and Resists-A Key to the Development of Nanoimprint Lithography

3. Mold-assisted nanolithography: A process for reliable pattern replication

4. Status and prospects of UV-Nanoimprint technology

5. Multiple imprinting in UV-based nanoimprint lithography: related material issues

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