Author:
Zaborowski Michał,Grabiec Piotr
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference2 articles.
1. Koen Snoeckx et al., Accurate fin patterning in emerging devices for 32nm and beyond Future Fab Intl. 23 (7/9/2007).
2. Nano-line width control & standards using Lateral Pattern Definition technique;Zaborowski;Microelectronic Engineering,2006
Cited by
1 articles.
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