Author:
Kaspar C.,Butschke J.,Irmscher M.,Martens S.,Burghartz J.N.
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference7 articles.
1. Controlling resist thickness and etch depth for fabrication of 3D structures in electron-beam grayscale lithography;Kim;Microelectron. Eng.,2007
2. A laser interferometer for monitoring thin film processes: application to polymer dissolution;Krasicky;Chem. Eng. Commun.,1987
3. Fundamental Principles of Optical Lithography: the Science of Microfabrication;Mack,2008
4. Comparison of recent development models in optical lithography simulation;Arthur,1998
5. Improved notch model for resist dissolution in lithography simulation;Robertson,2001
Cited by
3 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Thermal reflow of polymers for innovative and smart 3D structures: A review;Materials Science in Semiconductor Processing;2019-03
2. Accurate determination of 3D PSF and resist effects in grayscale laser lithography;34th European Mask and Lithography Conference;2018-09-19
3. Adjustable sidewall slopes by electron-beam exposure layout;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2017-11