A LASER INTERFEROMETER FOR MONITORING THIN FILM PROCESSES: APPLICATION TO POLYMER DISSOLUTION
Author:
Affiliation:
1. a School of Chemical Engineering, Olin Hall Cornell University , Ithaca, NY, 14853
Publisher
Informa UK Limited
Subject
General Chemical Engineering,General Chemistry
Link
https://www.tandfonline.com/doi/pdf/10.1080/00986448708911911
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1. Photosolubility of diazoquinone resists
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3. Characterization of positive resist development
4. In Situ Monitoring of Film Deposition Using He-Ne Laser System
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