Author:
Yuan Cadmus A.,van der Sluis Olaf,van Driel Willem D.,Zhang G.Q. (Kouchi)
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Safety, Risk, Reliability and Quality,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference57 articles.
1. International Technology Roadmap for Semiconductors (ITRS); 2006.
2. Structure of low dielectric constant to extreme low dielectric constant SiCOH films: Fourier transform infrared spectroscopy characterization;Grill;J Appl Phys,2003
3. Analytical modeling of reservoir effect on electromigration in Cu interconnects;Gan;J Mater Res,2007
4. Development of a low-dielectric-constant polymer for the fabrication of integrated circuit interconnect;Martin;Adv Mater,2000
5. A. Humbert, D. Badaroglu, R. Hoofman, The effect of plasma damage on the material composition and electrical performance of different generations of SiOCH low k films, Mater Res Soc Symp Proc. 914 (2006) 0914–F04–03.
Cited by
3 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献