Current-dependent hot-electron stresses on InGaP-gated and AlGaAs-gated low noise PHEMTs

Author:

Huang Hou-Kuei,Chang Cieh-Pin,Houng Mau-Phon,Wang Yeong-Her

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Safety, Risk, Reliability and Quality,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference11 articles.

1. X-band InGaP PHEMTs with 70% power-added efficiency;Kao;IEEE MTT-S Int Dig,1998

2. Super low noise InGaP gated PHEMT;Huang;IEEE Electron Dev Lett,2002

3. Noise characteristics of InGaP-gated PHEMTs under high current and thermal accelerated stresses;Huang;IEEE Trans Electron Dev,2005

4. Hot electron degradation of the DC and RF characteristics of AlGaAs/InGaAs/GaAs PHEMT’s;Borgarino;IEEE Trans Electron Dev,1998

5. A comparison of deep level effects on the DC characteristics of InxGa1−xP/In0.20Ga0.80As/GaAs and Al0.24Ga0.76As/In0.20Ga0.80As/GaAs high electron mobility transistors grown by solid source MBE;Yoon;IEEE IPRM Tech Dig,2001

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