A quantitative study of Phosphorous implantation damage on the thick gate oxide of the 28nm node-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

A quantitative study of Phosphorous implantation damage on the thick gate oxide of the 28nm node

Published:2014-09 Issue:9-10 Volume:54 Page:2306-2309
ISSN:0026-2714
Container-title:Microelectronics Reliability
language:en
Short-container-title:Microelectronics Reliability

Author:

Wan Xinggong,Chandrashekhar Sandhya,Bayha Boris,Trentzsch Martin,Balzer Torben,Siddabathula Mahesh,Aubel Oliver

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Safety, Risk, Reliability and Quality,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference5 articles.

1. Effects of ion implantation on deep-submicrometer, drain-engineered MOSFET technologies

2. A mechanism of gate oxide deterioration during As/sup +/ ion implantation

3. Arsenic ion implant energy effects on CMOS gate oxide hardness

4. Configurational statistical model for the damaged structure of silicon oxide after ion implantation

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP