Devices’ optimization against hot-carrier degradation in high voltage pLEDMOS transistor

Author:

Wu Hong,Qian Qinsong,Liu Siyang,Sun Weifeng,Shi Longxing

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Safety, Risk, Reliability and Quality,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference8 articles.

1. Douglas Brisbin, Andy Stranchan, Prasad Chaparala. PMOS drain breakdown voltage walk-in: a new failure mode in high power BiCMOS application. In: IEEE 42rd annual international reliability physics symposium, Phoenix; 2004. p. 265–8.

2. Moens P, Bauwens F, Nelson M, Tack M. Electron trapping and interface trap generation in drain extended pMOS transistors. In: IEEE 43rd annual international reliability physics symposium, San Jose; 2005. p. 555–9.

3. Moens P, Van den bosch G, Wojciechowski D, Bauwenset F, De Vleeschouwer H, De Pestel F. Charge trapping effects and interface state generation in a 40V lateral resurf pLEDMOS transistor. In: Proceeding of 35th European solid-state device research conference, Grenoble; 2005. p. 407–10.

4. Design and optimization of a hot-carrier resistant high-voltage nMOS transistor;Marco;IEEE Trans Electron Devices,2005

5. Optimization the hot carrier reliability of N-LDMOS transistor arrays;Douglas;Microelectron Reliab,2005

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