Author:
Devireddy Siva Prasad,Min Bigang,Çelik-Butler Zeynep,Tseng Hsing-Huang,Tobin Philip J.,Zlotnicka Ania
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Safety, Risk, Reliability and Quality,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference26 articles.
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4. Metal gate MOSFETs with HfO2 gate dielectric;Samavedam;VLSI Tech Dig,2002
5. Carrier mobility in advanced CMOS devices with metal gate and HfO2 gate dielectric;Lime;Solid State Electron,2003
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