Study of gate leakage mechanism in advanced charge-coupled MOSFET (CC-MOSFET) technology

Author:

Barletta G.,Ngwan V.C.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Safety, Risk, Reliability and Quality,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference10 articles.

1. B.J. Baliga Advanced power MOSFET concepts Ed. Spinger 2010 pg.159

2. G. Barletta High breakdown voltage semiconductor device with an insulated gate formed in a trench, and manufacturing process thereof, Patent US 20130001678A1, EP2541608A1, 2013

3. Characterization of thermally oxidized n+polycrystalline silicon;Faraone;IEEE Trans. Electron. Devices,1985

4. Conduction in thermal oxides grown on polysilicon and its influence on floating gate EEPROM degradation;Groeseneken;IEDM,1984

5. A model for electrical conduction in polysilicon oxide;Bisschop;IEEE Trans. Electron Devices,1996

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