Author:
Kalisz Małgorzata,Mroczyński Robert,Beck Romuald B.
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Safety, Risk, Reliability and Quality,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
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4. Kalisz M. et al. Effect of the fluorine implantation from r.f. CF4 plasma on electrical characteristics of MIS structures with PECVD silicon oxynitride layers Thin Solid Films, submitted for publication.
5. Irradiation effect on dielectric properties of hafnium and gadolinium oxide gate dielectrics;Garcia;J Vac Sci Technol B,2009
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