Properties study of ZnO films prepared by ALD
Author:
Publisher
Elsevier BV
Subject
Inorganic Chemistry,Organic Chemistry,Spectroscopy,Analytical Chemistry
Reference26 articles.
1. Growth characteristics and properties of Ga-doped ZnO (GZO) thin films grown by thermal and plasma-enhanced atomic layer deposition;Nam;Appl. Surf. Sci.,2014
2. Effect of ITO target crystallinity on the properties of sputtering deposited ITO films;Yang;Ceram. Int.,2020
3. Absorption–emission study of hydrothermally grown Al: ZnO nanostructures;Yogamalar;J. Alloys Compd.,2011
4. Optical and structural properties of Al2O3 doped ZnO nanotubes prepared by ALD and their photocatalytic application;Nasr;Surf. Coat. Technol.,2018
5. High energy (MeV) ion beam induced modifications in Al2O3-ZnO multilayers thin films grown by ALD and enhancement in photoluminescence, optical and structural properties;Gupta;Vacuum,2021
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