Recent progress in photoemission microscopy with emphasis on chemical and magnetic sensitivity-Reference-Cited by-同舟云学术

Recent progress in photoemission microscopy with emphasis on chemical and magnetic sensitivity

Published:1997-03 Issue:1-3 Volume:84 Page:171-188
ISSN:0368-2048
Container-title:Journal of Electron Spectroscopy and Related Phenomena
language:en
Short-container-title:Journal of Electron Spectroscopy and Related Phenomena

Author:

Swiech W,Fecher G.H,Ziethen Ch,Schmidt O,Schönhense G,Grzelakowski K,M. Schneider C,Frömter R,Oepen H.P,Kirschner J

Publisher

Elsevier BV

Subject

Physical and Theoretical Chemistry,Spectroscopy,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Radiation,Electronic, Optical and Magnetic Materials

Reference80 articles.

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