A novel integrated method realizing iteratively optimized modeling for proximity field patterning nanolithography-Reference-Cited by-同舟云学术

A novel integrated method realizing iteratively optimized modeling for proximity field patterning nanolithography

Published:2008-04 Issue:1 Volume:6 Page:69-80
ISSN:1569-4410
Container-title:Photonics and Nanostructures - Fundamentals and Applications
language:en
Short-container-title:Photonics and Nanostructures - Fundamentals and Applications

Author:

Su M.F.,El-Kady I.,Reda Taha M.M.,Christodoulou C.G.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Hardware and Architecture,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference22 articles.

1. Fabricating complex three-dimensional nanostructures with high-resolution conformable phase masks;Jeon,2004

2. S. Jeon, G. Wiederrecht, J.A. Rogers, Photonic systems formed by proximity field nanopatterning, in: E.G. Johnson, G.P. Nordin, T.J. Suleski (Eds.), Micromachining Technology for Micro-Optics and Nano-Optics III, Proc. SPIE, vol. 5720, 2005, pp. 187–195.

3. Fabricating three dimensional nanostructures using two photon lithography in a single exposure step;Jeon;Opt. Express,2006

4. Molded transparent photopolymers and phase shift optics for fabricating three dimensional nanostructures;Jeon;Opt. Express,2007

5. A novel FDTD application featuring OpenMP-MPI hybrid parallelization;Su,2004

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Fuzzy Learning of Talbot Effect Guides Optimal Mask Design for Proximity Field Nanopatterning Lithography;IEEE Photonics Technology Letters;2008-05