Fabricating three-dimensional nanostructures using two photon lithography in a single exposure step-Reference-Cited by-同舟云学术

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Fabricating three-dimensional nanostructures using two photon lithography in a single exposure step

Published:2006 Issue:6 Volume:14 Page:2300
ISSN:1094-4087
Container-title:Optics Express
language:en
Short-container-title:Opt. Express

Author:

Jeon Seokwoo,Malyarchuk Viktor,Rogers John A.,Wiederrecht Gary P.

Publisher

The Optical Society

Subject

Atomic and Molecular Physics, and Optics

Cited by 111 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Two decades of two-photon lithography: Materials science perspective for additive manufacturing of 2D/3D nano-microstructures;iScience;2023-04

2. Ultrafast 3D nanofabrication via digital holography;Nature Communications;2023-03-27

3. Ketocoumarin-Based Photoinitiators for High-Sensitivity Two-Photon Lithography;ACS Applied Polymer Materials;2023-03-20

4. Multiphoton Lithography of Organic Semiconductor Devices for 3D Printing of Flexible Electronic Circuits, Biosensors, and Bioelectronics;Advanced Materials;2022-06-16

5. An open source three-mirror laser scanning holographic two-photon lithography system;PLOS ONE;2022-04-15

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