Wafer-scale N-polar GaN heterogeneous structure fabricated by surface active bonding and laser lift-off

Author:

Tian Ye,Gao Runhua,Wang Xinhua,Mu Fengwen,Xu Peng,Ma Guoliang,Yuan Chao,Huang Sen,Sun Bing,Wei Ke,Liu Xinyu

Publisher

Elsevier BV

Reference25 articles.

1. N-polar III-nitride transistors, in: Semiconductors and Semimetals;Wong;Academic Press Inc.,2019

2. Thin-body N-Face GaN transistor fabricated by direct wafer bonding;Ryu;IEEE Electron Device Lett.,2011

3. N-face GaN/AlGaN HEMTs fabricated through layer transfer technology;Chung;IEEE Electron Device Lett.,2009

4. N-polar GaN: epitaxy, properties, and device applications;Mohanty;Prog. Quantum Electron,2023

5. High quality of N-polar GaN film fabricated by layer transfer technology using high selective material removal rate of CMP;Yu;Mater. Sci. Semicond. Process,2022

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