Influence of total gas pressure on the microstructure and properties of CrAlN films deposited by a pulsed DC balanced magnetron sputtering system
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Metals and Alloys,Mechanical Engineering,Mechanics of Materials
Reference33 articles.
1. Reactive sputtering of TiN films at large substrate to target distances
2. Ion-assisted sputtering of TiN films
3. TiN films created in close vicinity of transition from α-Ti(N) to δ-TiNx phase
4. Low‐energy (∼100 eV) ion irradiation during growth of TiN deposited by reactive magnetron sputtering: Effects of ion flux on film microstructure
5. Relation of deposition conditions of Ti-N films prepared by d.c. magnetron sputtering to their microstructure and macrostress
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