TiN films created in close vicinity of transition from α-Ti(N) to δ-TiNx phase-Reference-Cited by-同舟云学术

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TiN films created in close vicinity of transition from α-Ti(N) to δ-TiNx phase

Published:1991-07 Issue: Volume:140 Page:660-665
ISSN:0921-5093
Container-title:Materials Science and Engineering: A
language:en
Short-container-title:Materials Science and Engineering: A

Author:

Poulek V.,Musil J.,Valvoda V.,Dobiasova L.

Publisher

Elsevier BV

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Reference8 articles.

1. ε-Ti2N phase growth control in titanium nitride films

2. Laser-stimulated growth of the εTi2N phase in TiN films during d.c. reactive magnetron sputter deposition

3. Proc. IPAT 89 Conf.;Poulek,1989

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1. Depth profiling characterization of the nitride layers on gas nitrided commercially pure titanium;Materials Characterization;2021-11

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3. Influence of total gas pressure on the microstructure and properties of CrAlN films deposited by a pulsed DC balanced magnetron sputtering system;Journal of Alloys and Compounds;2010-08

4. Physical and Mechanical Properties of Hard Nanocomposite Films Prepared by Reactive Magnetron Sputtering;Nanostructured Coatings;2006

5. Effect of ion bombardment on properties of hard reactively sputtered Ti(Fe)Nx films;Surface and Coatings Technology;2004-01

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