Ti doped ZnO thin film based UV photodetector: Fabrication and characterization
Author:
Funder
Dong-Eui University
Publisher
Elsevier BV
Subject
Materials Chemistry,Metals and Alloys,Mechanical Engineering,Mechanics of Materials
Reference41 articles.
1. Preparation of fluorine-doped tin oxide films at low substrate temperature by an advanced spray pyrolysis technique, and their characterization;Shewale;Semicond. Sci. Technol.,2010
2. TiO2 ultraviolet detector based on LaAlO3 substrate with low dark current;Lv;J. Alloys Comp.,2013
3. 6.03 – Electronic and optoelectronic devices based on semiconducting zinc oxide, comprehensive;Phillips;Semicond. Sci. Technol.,2011
4. Thickness dependent H2S sensing properties of nanocrystalline ZnO thin films derived by advanced spray pyrolysis;Shewale;Sens. Actuators, B,2013
5. Leidenfrost temperature related CVD-like growth mechanism in ZnO–TFTs deposited by pulsed spray pyrolysis;Ortel;J. Cryst. Growth,2013
Cited by 88 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Heterostructured core-shell metal oxide-based nanobrushes for ultrafast UV photodetectors;Materials Science and Engineering: R: Reports;2024-09
2. Reduced Persistent Photoconductivity in Successive Ionic Layer Adsorption and Reaction‐Deposited ZnO:Sn Thin Films;physica status solidi (a);2024-08-27
3. High-performance transparent AZO UV photodetectors;Optical and Quantum Electronics;2024-06-27
4. Self-Powered Photodetectors with Nickel-Doped ZnO Nanorods for Operation in Low-Light Environments;ACS Applied Nano Materials;2024-04-17
5. Tailoring the electrical and magneto-electric transport properties of ZnO films via Ti ion implantation;Journal of Applied Physics;2024-04-12
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3