Author:
Tanaka H,Abe Y,Yoneyama T,Ishikawa J,Takenaka O,Inoue K
Subject
Electrical and Electronic Engineering,Metals and Alloys,Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation,Electronic, Optical and Magnetic Materials
Reference6 articles.
1. Inhibition of pyramid formation in the etching of Si p(100) in aqueous potassium hydroxide–isopropanol;Campbell;J. Micromech. Microeng.,1995
2. A. Hein, O. Dorcsh, E. Obermeier, Effects of metallic impurities on etching of silicon in aqueous KOH-solutions, Tech. Digest, 10th Int. Conf. on Solid-State Sensors and Actuators (Transducers'97), 1997, pp. 687–690.
3. K. Inoue, H. Tanaka, Y. Abe, T. Yoneyama, Ishikawa, O. Takenaka, Silicon etching in aqueous potassium hydroxide containing ppb-level copper, Proc. of Microstructures and Microfabricated Systems IV, 1998, pp. 219–226.
4. M. Pourbaix, Atlas of Electrochemical Equilibria in Aqueous Solutions, Houston, TX, NACE, 1966.
5. Anisotropic etching of crystalline silicon in alkaline solutions: I. Orientation dependence and behavior of passivation layers;Seidel;J. Electrochem. Soc.,1990
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