Accelerated C-face polishing of silicon carbide by alkaline polishing slurries with Fe3O4 catalysts-Reference-Cited by-同舟云学术

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Accelerated C-face polishing of silicon carbide by alkaline polishing slurries with Fe3O4 catalysts

Published:2021-12 Issue:6 Volume:9 Page:106863
ISSN:2213-3437
Container-title:Journal of Environmental Chemical Engineering
language:en
Short-container-title:Journal of Environmental Chemical Engineering

Author:

Wang Xuehan,Chen Jiapeng,Bu Zhengzheng,Wang Hanqiang,Wang Wenjun,Li Weimin,Sun Tao

Funder

National Natural Science Foundation of China

Publisher

Elsevier BV

Subject

Process Chemistry and Technology,Pollution,Waste Management and Disposal,Chemical Engineering (miscellaneous)

Reference38 articles.

1. Material science and device physics in SiC technology for high-voltage power devices;Kimoto;Jpn. J. Appl. Phys.,2015

2. Current status and perspectives of ultrahigh-voltage SiC power devices;Kimoto;Mater. Sci. Semicond. Process.,2018

3. Ultrahigh recovery of fracture strength on mismatched fractured amorphous surfaces of silicon carbide;Cui;ACS Nano,2019

4. In situ TEM observation of rebonding on fractured silicon carbide;Zhang;Nanoscale,2018

5. Unprecedented piezoresistance coefficient in strained silicon carbide;Cui;Nano Lett.,2019

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1. Tribological behavior of polycrystalline diamond based on photo-Fenton reaction;Diamond and Related Materials;2023-12

2. Polishing of diamond, SiC, GaN based on the oxidation modification of hydroxyl radical: Status, challenges and strategies;Materials Science in Semiconductor Processing;2023-11

3. Study of catalytic properties and grinding performance of single-crystal SiC heterogeneous Fenton reaction grinding discs;2023-07-25

4. Catalytic mechanism of tribochemical mechanical polishing on (0001) C-face of single crystal 6H-SiC substrate;The International Journal of Advanced Manufacturing Technology;2023-05-20

5. Structure-Performance Relationships of Complexing Agents on the Chemical Mechanical Polishing of 6063 Aluminum Alloy;ECS Journal of Solid State Science and Technology;2023-04-01

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