Plasma-induced damage-Reference-Cited by-同舟云学术

Plasma-induced damage

Published:1999-11 Issue:1-2 Volume:49 Page:65-81
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Viswanathan C.R.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference25 articles.

1. Plasma Etching;Manos,1989

2. Solid State Technology;Foansh,1994

3. Charging damage to gate oxides in an O2magnetron plasma

4. A model and experiments for thin oxide damage from wafer charging in magnetron plasmas

5. Electrical characterization of plasma etching damage in ULSI processing;Li,1995

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