Suitability of new polymer materials with adjustable glass temperature for nano-imprinting-Reference-Cited by-同舟云学术

Suitability of new polymer materials with adjustable glass temperature for nano-imprinting

Published:1999-05 Issue:1-4 Volume:46 Page:431-434
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Pfeiffer K.,Bleidiessel G.,Gruetzner G.,Schulz H.,Hoffmann T.,Scheer H.-C.,Sotomayor Torres C.M.,Ahopelto J.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference12 articles.

1. Imprint of sub‐25 nm vias and trenches in polymers

2. Imprint Lithography with 25-Nanometer Resolution

3. Nanoimprint lithography

4. Proc. 5th Zwickauer Automatisierungs-forum/Microsystem Technology;Scheer,1997

5. Hot embossing in polymers as a direct way to pattern resist

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